N,N,N’,N’,N”,N”-Hexamethylsilanetriamine [ACD/IUPAC Name]
N,N,N’,N’,N”,N”-Hexaméthylsilanetriamine [French] [ACD/IUPAC Name]
N,N,N’,N’,N”,N”-Hexamethylsilantriamin [German] [ACD/IUPAC Name]
Silanetriamine, N,N,N’,N’,N”,N”-hexamethyl- [ACD/Index Name]
3dmas : [(ch3)2n]3sih
Tris (dimethylamino ) silane
Structure of Tris(dimethylamino)silane CAS 15112-89-7
Hazard statementsH225 – H261 – H302 – H311 – H314 – H330
Precautionary StatementsP210 – P231 + P232 – P280 – P303 + P361 + P353 – P304 + P340 + P310 – P305 + P351 + P338
Specifications and Other Information of Our
Under room temperature away from light
Tris(dimethylamino)silane be used as a CVD precursor material for the deposition of thin film materials such as silicon oxide, silicon nitride, and more. This is crucial in semiconductor manufacturing and thin-film coating processes. And serves as a precursor for organosilicon polymers, which are used to create high-performance silicone materials known for their excellent heat and chemical resistance. These materials find applications in coatings, sealants, adhesives, and more.
Tris(dimethylamino)silane can be employed to modify the surface properties of materials, enhancing their wetting, adhesion, and chemical resistance. This is widely used in the manufacturing of coatings, wallpaper coatings, plastics, and other products.
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